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Jon Drobny edited this page Nov 30, 2021
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19 revisions
He incident on TiO2-Al-Si
This example concerns moderate energy helium ions incident on a layered target, consisting of a layer of titanium dioxide deposited on a layer of aluminum on a silicon substrate.
This figure shows the helium implantation distribution for a layered target. The titanium dioxide layer is 0.01 microns thick, the aluminum 0.03, and the silicon substrate 0.5. A comparison with the code F-TRIDYN[1] is included.
This figure shows the reflected helium angular distributions for a layered target. A comparison with F-TRIDYN is included[1].
Input File
The input file(s) for this simulation is located below: